MAGNETIC FIELD REGULATION IN THE RETUNED MAGNETRON SPUTTERING SYSTEM WITH A TARGET OF FINAL SIZES

Abstract

The PURPOSE of the paper is to extend the functional capabilities of the magnetron sputtering technology when machining the substrates of complex geometry. METHODS. Laplace’s equation is used to determine the distribution nature of magnetic field components in the retuned magnetron sputtering system (RMSS) with the target of final sizes. RESULTS. The theoretical relationships of magnetic field components in RMSS are given depending on RMSS parameters and movement speed of the target cathode. CONCLUSION. The prospects of this method of magnetic field calculation in RMSS gaps under sputtering (processing) of long substrates of complex geometry (for example, gas turbine engine blades) is shown when using vacuum ion-plasma treatment.